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Silicon Dioxide RIE Etching
Equipment: Reactive Ion Etcher (RIE)

SCHEDULER IS REQUIRED

Other material RIE etching: Silicon, Nitride, Photoresist

Simple Recipe
  1. Recipe
    2. Power (Watts) Etch Rate (nm) Selectivity vs. Photoresist
    100 27.5 0.9
    200 79.4 0.487
    250 121 0.759
    300 144 NA

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