Ion Implantation: Projected Range & Straggle Calculator

Substrate:	Si   Amorphous Si   SiO2   Si3N4
Dopant:	Arsenic   Boron   Phosphorus
Ion Energy:	[keV] (0-200)
Projected Range:	[µm]
Projected Straggle:	[µm]
Click here for a list of Ion Implantation Houses.